Product Details Name: Mechanical exfoliation WS2 on SiO2/Si Characterizations Substrate: SiO2/Si Oxide layer:300nm Substrate Size: 10 mm x 10 mm WS2 area:＞10 µm2 Application Fields Such materials have fewer defects and excellent optical properties, which can be used to study the number of layers and fluorescence effect. In addition, because of their original lattice structure, these materials are ideal materials for making devices Related Information Please e-mail for the detailed characterization data. E-mail:sale@xfnano.com |